Fabrication

The ARC maintains a significant capability in materials fabrication. This capability is supported by a variety of technologies that allow the deposition, evaporation, and etching of materials.In the area of deposition, the ARC supports Pulsed Laser Deposition (PLD) and Electron Cyclotron Resonance (ECR) Plasma Deposition.

E-Beam Evaporation as well as Sputtering and Mask Aligners are also available.In addition, ARC has the capability of both conventional and Radio Frequency (RF) Etching. Some of the systems available in ARC laboratories include the following:

Pulsed Laser Deposition (PLD) System

E-Beam Evaporation

Sputtering

Mask Aligners

Radio Frequency (RF) Etching

Electron Cyclotron Resonance (ECR) Plasma Deposition